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Suche nach „[Y.] [Liu]“ hat 26 Publikationen gefunden
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    F: Elektrotechnik und MedientechnikI: IQMA

    Zeitschriftenartikel

    D. Liu, Günther Benstetter, Y. Liu, X. Xang, S. Yu, T. Ma

    Medium- to high-pressure plasma deposition of a-C:H films by dielectric barrier discharge

    New Diamond and Frontier Carbon Technology, vol. 13, no. 4, pp. 191-206

    2003

    F: Elektrotechnik und MedientechnikI: IQMA

    Zeitschriftenartikel

    D. Li, Günther Benstetter, Edgar Lodermeier, I. Akula, I. Dudarchyk, Y. Liu, T. Ma

    SPM investigation of diamond-like carbon and carbon nitride films

    Surface & Coatings Technology, vol. 172, no. 2-3, pp. 194-203

    2003

    DOI: 10.1016/S0257-8972(03)00338-4

    Abstract anzeigen

    Scanning probe microscopy was used to evaluate and compare the surface roughness, mechanical and tribological properties of hydrogenated (a-C:H) and tetrahedral (ta-C) diamond-like carbon (DLC) and amorphous carbon nitride (a-C:N) films. Compared to the a-C:H and a-C:N films, the ta-C films exhibit the lowest surface roughness. The soft surface layers of DLC and a-C:N films were revealed by nanowear tests and their thickness varies over the range of 0.2 to 4.1 nm. The nanoscale friction coefficient measurements from lateral force microscopy shows that these films have obviously different friction coefficients. The lower friction coefficients of ta-C and a-C:N films can be attributed to the existence of soft graphite-like surface structure. We proposed the deposition processes of DLC and a-C:N films, where their surface roughness, structure and mechanical properties were associated with the vapor plasma particle energy distribution.

    F: Elektrotechnik und MedientechnikI: IQMA

    Zeitschriftenartikel

    D. Liu, Günther Benstetter, Y. Liu, T. Ma

    Surface roughness, scratch resistance and tribological properties of hydrogenated amorphous carbon coatings prepared by low-pressure dielectric barrier discharge

    Surface & Coatings Technology, vol. 174-175, no. September/Oktober, pp. 310-315

    2003

    DOI: 10.1016/S0257-8972(03)00649-2

    Abstract anzeigen

    In this study, we explored the surface roughness, scratch resistance and tribological properties of hydrogenated amorphous carbon (a-C:H) coatings deposited on silicon substrates from low-pressure dielectric barrier discharge (DBD) plasmas of CH4 by using an atomic force microscope (AFM), AFM-based scratch testing technique and lateral force microscope. The AFM and scratch measurements show that the surface roughness and scratch resistance of these a-C:H coatings strongly depend on the Pd value (the product of CH4 pressure P, and discharge gas spacing d) and the a-C:H coatings deposited at suitable Pd value (typically 350 Pa mm) exhibit lower surface roughness and better scratch resistance. The a-C:H coatings deposited at the Pd value of 350–1750 Pa mm have the typical friction coefficient of approximately 0.13. The lower friction coefficient (0.11) of the a-C:H coating deposited at the smaller Pd value of 245 Pa mm can be associated with its graphite-like surface structure. The results indicate the coating structure changes from the one of graphite-like to diamond-like to polymer-like with the Pd value increasing from 245 to 1750 Pa mm. The relationship between the measured coating properties and the DBD deposition processes was presented.

    F: Elektrotechnik und MedientechnikI: IQMA

    Zeitschriftenartikel

    D. Liu, Günther Benstetter, Edgar Lodermeier, X. Chen, J. Ding, Y. Liu, J. Zhang, T. Ma

    Surface and structural properties of ultrathin diamond-like carbon coatings

    Diamond and Related Materials, vol. 12, pp. 1594-1600

    2003

    DOI: 10.1016/S0925-9635(03)00248-6

    Abstract anzeigen

    Nanoscale wear resistance, friction, and electrical conduction tests using atomic force microscope (AFM) have been conducted on ultrathin diamond-like carbon (DLC) coatings, including tetrahedral amorphous carbon (ta-C) deposited using pulsed cathodic arc (PCA) and filtered-PCA, and hydrogenated amorphous carbon (a-C:H) deposited using electron cyclotron resonance—chemical vapor deposition (ECR-CVD). The low-resistant layers at the surfaces of these thin DLC coatings were revealed by AFM-based nanowear tests. Their thickness is mainly determined by the deposition methods and does not show an obvious variation with the coating thickness decreasing from tens of nm to a few nm. The ∼3 nm ta-C coatings from PCA and filtered-PCA deposition were found to have the stable bulk structure beneath the thin (0.3–0.95 nm) surface layers. The ∼3 nm a-C:H coating from ECR-CVD had the extremely low load-carrying capacity and exhibited the evidence of coating delamination, which can be related to the thicker (1.5±0.1 nm) soft surface layers of a-C:H coatings. The results from conducting-AFM measurements indicate that a-C:H coatings have H and sp3 C enrichment surface layers while the soft surface layers of ta-C coatings have graphite-like structure. The nanoscale friction coefficients of these thin ta-C and a-C:H coatings were compared by AFM-based lateral force microscope. The lower friction coefficient of ta-C coatings can be attributed to the existence of graphite-like surface structure.

    F: Elektrotechnik und MedientechnikI: IQMA

    Vortrag

    D. Liu, Günther Benstetter, Y. Liu, T. Ma

    Surface Roughness and Mechanical Properties of a-C:H Films Prepared by Low-pressure Dielectric Barrier Discharge

    International Conference on Plasma Surface Engineering (PSE2002), Garmisch-Partenkirchen

    2002

    I: Hochschulleitung und -einrichtungen

    Beitrag (Sammelband oder Tagungsband)

    Y. Zhao, Peter Sperber, T. Wang, C. Fan, N. Liu, X. Han, Ch. Liu

    Test Report of Clock Distributor in Changchun and Beijing

    Proceedings of the 12th International Workshop on Laser Ranging, Matera, Italien, 16.-20.10.2000

    2000