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Magnetic films for electromagnetic actuation in MEMS switches
Microsystem Technologies, vol. 24, no. 4, pp. 1987-1994
This paper investigates the fabrication of magnetic films via electroplating to be applied into electromagnetic actuated micro electro-mechanical systems (MEMS) switches. Cobalt and nickel films (1 µm thicknesses) were deposited on gold coated silicon substrates via electrochemical deposition. Different deposition conditions were investigated, regarding temperature and deposition voltage. The films morphologies were characterized via atomic force microscopy, while the magnetic properties of the films were characterized via vibrating sample magnetometer measurements. In order to evaluate the integration of these magnetic films into MEMS switches with low energy consumption, a mathematical model was developed and the results show that these films can be applied into efficient actuation with reduced power dissipation.