Publikationen


Suche nach „[Jogwich] [Martin]“ hat 19 Publikationen gefunden
Suchergebnis als PDF
    DigitalElektrotechnik und Medientechnik

    Zeitschriftenartikel

    Martin Jogwich

    Smart & günstig. Kostengünstige, intelligente Kamera auf Raspberry-Pi-Basis

    inVISION - Bildverarbeitung/Embedded Vision/3D Messtechnik, no. 5, pp. 90-91

    2018

    Elektrotechnik und Medientechnik

    Beitrag (Sammelband oder Tagungsband)

    Martin Jogwich

    Virtuelles Automatisierungstechniklabor in der Lehre

    Tagungsband 11. Fachkonferenz AALE 2014, Regensburg, München

    2014

    ISBN: 9783835671423

    Elektrotechnik und Medientechnik

    Zeitschriftenartikel

    Martin Jogwich, Martina Reitmaier-Krebs

    Virtuelles Labor für Automatisierungstechnik - Simulationssoftware erlaubt interaktives Lernen

    atp edition - Automatisierungstechnische Praxis, no. 5

    2011

    Elektrotechnik und Medientechnik

    Buch (Monographie)

    Martin Jogwich, A. Jogwich

    Technische Strömungsmechanik für Studium und Praxis

    [reibungsfreie und reibungsbehaftete Strömung : Duchflussmessung ; erweiterte Energiegleichung]

    2009

    ISBN: 978-3835631687

    Elektrotechnik und Medientechnik

    Vortrag

    Martin Jogwich, et al.

    Erprobung von APC- und Optimierungswerkzeugen an einem Ammoniakanlagen-Trainingssimulator

    3. VDI/VDE-Aussprachetag „Rechnergestützter Entwurf von Regelungssystemen“, Dresden

    2001

    Elektrotechnik und Medientechnik

    Vortrag

    Martin Jogwich, et al.

    Plant Management System and Advanced Process Control for Ammonia Plants

    Aspenworld 2000, Orlando, FL; USA

    2000

    Elektrotechnik und Medientechnik

    Zeitschriftenartikel

    Martin Jogwich, H. Ortner, C.-J. Lorenzen, et al., T. Schneider

    Elementanalyse von Fertigmischungen technischer Gummiwaren mittels laserinduzierter Emissionsspektralanalyse

    KGK - Kautschuk Gummi Kunststoffe, vol. 49, no. 1

    1996

    Elektrotechnik und Medientechnik

    Zeitschriftenartikel

    Martin Jogwich, K. Wiesemann, K. Fu, M. Knebel

    Atomic Transition Probabilities and Lifetimes for the Cu I System

    Atomic Data and Nuclear Data Tables, vol. 61, no. 1, pp. 1-30

    1995

    DOI: 10.1016/S0092-640X(95)90009-8

    Abstract anzeigen

    Measured and calculated transition probabilities, oscillator strengths, and wavelengths for Cu I atomic transitions and measured and calculated lifetimes of Cu I states are tabulated. Data published from 1957 to mid-1994 are covered in this compilation.

    Elektrotechnik und Medientechnik

    Zeitschriftenartikel

    Martin Jogwich, C. Carlhoff, C.-J. Lorenzen

    Analyse von Kunststoffen durch laserinduzierte Emissionsspektralanalyse

    Laser-Praxis, vol. 10, pp. 86-88

    1994

    Elektrotechnik und Medientechnik

    Beitrag (Sammelband oder Tagungsband)

    Martin Jogwich, K. Fu, et al.

    Atomic Transition Probabilities and Lifetimes for the Cu I System

    Bericht 30-A7-93 des Sonderforschungsbereichs "Physikalische Grundlagen der Niedertemperaturplasmen"

    1993

    Elektrotechnik und Medientechnik

    Zeitschriftenartikel

    Martin Jogwich, C. Carlhoff, C.-J. Lorenzen, U. Hahn

    Application of Laser-Induced Emission Spectral Analysis for Industrial Process and Quality Control

    Journal of Analytical Atomic Spectrometry, vol. 7, no. 6, pp. 1029-1035

    1992

    DOI: 10.1039/JA9920701029

    Abstract anzeigen

    Laser-induced emission spectral analysis (LIESA, a registered trademark of instruments developed by Krupp), better known in the literature as laser microanalysis or laser-induced breakdown spectroscopy, is a suitable method for the direct in-process measurement of elemental concentrations in various solid and liquid materials. This method has been developed recently by Krupp for in-process quality assurance and process control in different industrial branches such as steel production and plant making. As a result several LIESA instruments have already been developed or are under development for marketing. In all cases on-line and in-process elemental analysis of materials at various stages of production yield information on the quality of the material and the fabrication process. The beam of a pulsed high-power laser (irradiance: 1 × 108–5 × 109 W cm–2), focused onto the solid or liquid sample surface in an ambient gas atmosphere of normal pressure (focus area≈ablation area, 0.1–6 mm2), produces a hot bright plasma (early electron temperatures, 20000–30000 K). The emitted plasma light is observed end-on and passes by way of an optical fibre bundle to a spectrometer, where it is detected in the focal plane by means of an optical multichannel analyser with high time resolution (on the microsecond scale). A fast computer evaluates the measured spectra and calculates the element concentrations via calibration procedures. Relative detection limits of between 10 and 100 ppm can be achieved for most of the detectable elements in various matrices (steel, rubber, rock and glass). Procedures are available to convert relative measurements with relative standard deviations of between 1 and 2% into absolute concentration values with relative accuracies of about 3%.

    Elektrotechnik und Medientechnik

    Zeitschriftenartikel

    Martin Jogwich, B. Huber, K. Wiesemann

    A Spectroscopic Study of Double Electron Transfer from Cu to ArIII in an ECR-Microwave Discharge

    Zeitschrift für Physik D: Atoms, Molecules and Clusters, vol. 17, no. 3, pp. 171-179

    1990

    Abstract anzeigen

    We present spectroscopic measurements of rate coefficients for the population of the ArI 6d[3/2] o and 8s[3/2] o states by two electron transfer from sputtered Cu to Ar2+ in an ECR microwave discharge. Rate coefficients are obtained from absolutely measured line intensities using a modified corona model. Though the binding energies of these states differ by 8 meV only the probability of populating the 6d level exceeds by a factor of ten that of populating the 8s level. This is attributed to an energy resonance between the two electrons when promoting to their final levels. The cross section for this two electron transfer comes out to be of the order of 10−15 to 10−14 cm2.

    Elektrotechnik und Medientechnik

    Vortrag

    Martin Jogwich

    Bestimmung der Ratenkoeffizienten von Zweielektronen-Transferprozessen zwischen Cu und Ar2+ in einer EZR-Entladung

    DPG-Frühjahrstagung/Verhandlungen DPG 3/1990 P-9.1, München

    1990

    Elektrotechnik und Medientechnik

    Beitrag (Sammelband oder Tagungsband)

    Martin Jogwich, et al.

    Selective Population of the Ar I 6d[3/2]0 Level by Two Electron Transfer from Copper

    Posterpräsentation

    Proceedings of the International Conference on Phenomena in Ionized Gases (ICPIG) XIX, Belgrad, Jugoslawien, 1989

    1989

    Elektrotechnik und Medientechnik

    Vortrag

    Martin Jogwich, et al.

    Zweielektronentransfer zwischen Cu und Ar2+ in einer EZR-Entladung

    DPG-Frühjahrstagung, Verhandlungen DPG 1/1988 P-11.6, Düsseldorf

    1988

    Elektrotechnik und Medientechnik

    Zeitschriftenartikel

    Martin Jogwich, et al.

    Selective Population of the Ar I 6d[3/2]0 Level by Two Electron Transfer from Copper

    Europhysics Conference Abstracts, vol. 12, no. 69

    1988

    Elektrotechnik und Medientechnik

    Vortrag

    Martin Jogwich, et al.

    VUV-Spektroskopie hochangeregter ArI-Linien einer EZR-Entladung

    DPG-Frühjahrstagung, Verhandlungen DPG 3/1987 P-22.7, Göttingen

    1987

    Elektrotechnik und Medientechnik

    Vortrag

    Martin Jogwich, A. Hardtke, M. Frank, et al.

    12th European Conference on Controlled Fusion and Plasma Physics

    1985

    Elektrotechnik und Medientechnik

    Beitrag (Sammelband oder Tagungsband)

    Martin Jogwich

    Selektive Besetzung hochangeregter ArI-Zustände durch einen Zweielektronentransfer zwischen Cu und ArIII in einer EZR-Mikrowellenentladung

    SFB-Report Plasmaphysik Bochum/Jülich 89-05-185

    0