Publikationen


Suche nach „[B.] [Ludwig]“ hat 3 Publikationen gefunden
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    MobilElektrotechnik und Medientechnik

    Beitrag (Sammelband oder Tagungsband)

    S. Kerscher, N. Balbierer, S. Kraust, A. Hartmannsgruber, Nikolaus Müller, B. Ludwig

    Intention-Based Prediction for Pedestrians and Vehicles in Unstructured Environments

    VEHITS 2018

    2018

    ISBN: 978-989-758-293-6

    Abstract anzeigen

    Motion prediction for holonomic objects in unstructured environments is an ambitious task due to their high freedom of movement compared with non-holonomic objects. In this paper, we present a method for inferring the future goal of holonomic objects by a heuristic generation of target points (tp) and following discriminating decision making. The target points are generated, in a manner that covers the most common motion hypotheses like following or staying, safety relevant motion hypotheses like crossing future ego trajectories or the movement to special points of interest, e.g. gained from a map. Subsequently, for each considered object a trajectory to the inferred target point will be planned. Finally, the uncertainty of the trajectory is estimated by applying a Kalman Filter with a dynamically adjusted process noise matrix. An additional benefit of this concept is its ability to cope with a different quality of context knowledge, so it can produce sound results even at poor structured environments.

    NachhaltigAngewandte Naturwissenschaften und WirtschaftsingenieurwesenTAZ Spiegelau

    Zeitschriftenartikel

    Günther Ruhl, R. Dietrich, R. Ludwig, N. Falk, T. Morrison, B. Stoehr

    Optimizing the Chromium Dry Etch Process

    Semiconductor International, vol. 24, pp. 239-246

    2001

    Abstract anzeigen

    A dry etch process for etching chromium-on-glass masks was developed and optimized. During optimization for minimum etch bias, a new type of metrology tool was used to measure critical dimensions and characterize the sidewall profiles of both the photoresist and the final mask structures.

    NachhaltigAngewandte Naturwissenschaften und WirtschaftsingenieurwesenTAZ Spiegelau

    Beitrag (Sammelband oder Tagungsband)

    Günther Ruhl, R. Dietrich, R. Ludwig, N. Falk, T. Morrison, B. Stoehr

    Chrome dry etch characterization using Surface Nano Profiling

    Proceedings of the 20th Annual BACUS Symposium on Photomask Technology (September 13-15, 2000; Monterey, CA, USA), vol. Vol. 4186

    2001

    DOI: 10.1117/12.410753

    Abstract anzeigen

    In this paper we describe the development of a chrome dry etch process on a new type of mask etch tool. One crucial goal was to minimize the CD etch bias. To meet this goal, a procedure for the direct characterization of CD etch bias was developed. The common methods for measuring the CD etch bias as resist-to-chrome CD difference, such as confocal optical microscope or SEM measurement, only give correct results, if the sidewalls are identical to the calibration standard. This is normally not the case as, due to the differing step height of resist and chrome, and the fact that during process development, in particular, the sidewall shapes and angles can vary significantly. Thus, it is very important to use a CD measurement method which takes the sidewall shapes (slope, foot) into account. One novel method is the use of a Scanning Nano Profiler (SNP) which was derived from the AFM principle. In contrast to AFM the use of a special high aspect ratio tip with 90° sidewall angle, in combination with pixelwise scanning of the substrate surface, provides information about the true sidewall shape and CD.